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碳化硅基碳化硅外延片
6 inch SiC-Epi on SiC-sub

Features

  • 15mm pitch 9pts (EE=4mm)

  • Thickness by FT-IR

  • Carrier Concentration by Hg-CV

Specification

Item

Specification

Tolerance

Typical

Unit

Remark

Diameter

6" (150mm)

-

-

Inch/mm


Poly-type

4H

-

-



Surface

(0001) Silicon face

-

-



Off orientation

4 degree-off

-

-



Conductivity

N-type

-

-



Dopant

Nitrogen

-

-



Carrier concentration

1E15 ~ 3E16/cm3

±12% ~ ±20%

±8%

cm-3 

All Means, points

Epi Thickness

5μm ~ 30μm

±8% ~ ±10%

±6%



PDD

≤2.0 /cm2

-

≤0.3 /cm2

cm-2

(THK 5μm ~ 30μm)

BPD 2mm yield

> 92%

-

-



Surface Defect

≦ 2%

-

-

cm2


Usable Area

≦ 90%

-

-

%


Step Bunching 

≦ 2.0

-

-

nm


Scratchies 

< 100 

-

-

mm 


Roughness (10μm x 10μm)

< 0.5 

-

-

nm


Backside contamination 

< 5% 

-

-

%



Standard epitaxial structure

NO.

EPI Layer

Thickness (μm)

Dopant

Carrier Concentration (1/cm3)

1

SiC n- doping layer

5 ~ 25

n-type

5x1015 ~  5x1016

2

SIC Substrate

-

n-type

-


SiC MOSFET Reference structure

NO.

EPI Layer

Thickness (μm)

Dopant

Carrier Concentration (1/cm3)

1

SiC n- doping layer

20

n-type

8x1015

2

SIC Substrate

-

n-type

-


SiC SBD Reference structure

NO.

EPI Layer

Thickness (μm)

Dopant

Carrier Concentration (1/cm3)

1

SiC n- doping layer

14 

n-type

5x1015

2

SIC Substrate

-

n-type

-

QQ

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